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Course Description |
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Course Name |
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Microfabrication and basic processes in VLSI technology |
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Course Code |
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EE-653 |
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Course Type |
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Optional |
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Level of Course |
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Second Cycle |
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Year of Study |
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1 |
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Course Semester |
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Fall (16 Weeks) |
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ECTS |
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6 |
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Name of Lecturer(s) |
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Asst.Prof.Dr. MUTLU AVCI |
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Learning Outcomes of the Course |
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Explains basic processes of microfabrication Simulates basic processes in two and three dimensions Plans a CMOS production process Extracts electronic models of devices
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Mode of Delivery |
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Face-to-Face |
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Prerequisites and Co-Prerequisites |
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None |
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Recommended Optional Programme Components |
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None |
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Aim(s) of Course |
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To understand integrated circuit fabrication process and simulation methods |
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Course Contents |
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An overview of microelectronic technology, comparison of silicon and III-V compound semiconductor technologies, basic processes of microelectronic fabrication, lithography and equipments of pattern transfer, basic concept of gases and plasma, formation of solid thin films by CVD and PVD methods, oxide, nitride and polysilicon thin layers and their use by VLSI technology, doping processes, ion implementation, diffusion and epitaxy, wet and dry etcing, contact formation and multilevel metallization in VLSI, isolation techniques in VLSI and ULSI, examples for CMOS and BİCMOS process integration, MEMS fabrication. |
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Language of Instruction |
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English |
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Work Place |
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Electrical-Electronics Engineering Department Graduate course classroom |
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Course Outline /Schedule (Weekly) Planned Learning Activities |
| Week | Subject | Student's Preliminary Work | Learning Activities and Teaching Methods |
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1 |
Introduction to microfabrication |
Reading corresponding chapter of text book |
Slide presentation |
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2 |
Monocrytal semiconductor manufacturing |
Reading corresponding chapter of text book |
Slide presentation |
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3 |
Epitaxiel growth |
Reading corresponding chapter of text book |
Slide presentation |
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4 |
Oxidation |
Reading corresponding chapter of text book |
Slide presentation |
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5 |
Diffusion |
Reading corresponding chapter of text book |
Slide presentation |
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6 |
Litography |
Reading corresponding chapter of text book |
Slide presentation |
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7 |
Problem hour |
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Problem solving |
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8 |
Midterm exam |
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written exam |
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9 |
Ion implantation |
Reading corresponding chapter of text book |
Slide presentation |
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10 |
Thin film deposition |
Reading corresponding chapter of text book |
Slide presentation |
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11 |
Metal deposition |
Reading corresponding chapter of text book |
Slide presentation |
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12 |
I/O contacts |
Reading corresponding chapter of text book |
Slide presentation |
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13 |
ESD protection |
Reading corresponding chapter of text book |
Slide presentation |
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14 |
A CMOS manufacturing process design |
Reading corresponding chapter of text book |
Slide presentation |
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15 |
A BJT manufacturing process design |
Reading corresponding chapter of text book |
Slide presentation |
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16/17 |
Extraction of device electronic characteristics |
Reading corresponding chapter of text book |
Slide presentation |
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Required Course Resources |
| Resource Type | Resource Name |
| Recommended Course Material(s) |
R. C. Jaeger, Introduction to Microelectronic Fabrication (Vol. V of the Modular Series on Solid State Devices), 2nd Ed. Upper Saddle River, New Jersey: Prentice Hall, 2002.
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| Required Course Material(s) | |
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Assessment Methods and Assessment Criteria |
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Semester/Year Assessments |
Number |
Contribution Percentage |
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Mid-term Exams (Written, Oral, etc.) |
1 |
70 |
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Homeworks/Projects/Others |
3 |
30 |
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Total |
100 |
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Rate of Semester/Year Assessments to Success |
40 |
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Final Assessments
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100 |
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Rate of Final Assessments to Success
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60 |
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Total |
100 |
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| Contribution of the Course to Key Learning Outcomes |
| # | Key Learning Outcome | Contribution* |
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1 |
Communicates with people in an appropriate language and style. |
2 |
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2 |
Specializes by furthering his knowledge level at least in one of the basic subfields of electiral-electronic engineering. |
5 |
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3 |
Grasps the integrity formed by the topics involved in the field of specialization. |
4 |
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4 |
Grasps and follows the existing literature in the field of specialization. |
4 |
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5 |
Comprehends the interdisciplinary interaction of his field with other fields. |
5 |
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6 |
Has the aptitude to pursue theoretical and experimental work. |
4 |
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7 |
Forms a scientific text by compiling the knowledge obtained from research. |
4 |
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8 |
Works in a programmed manner within the framework set by the advisor on the thesis topic, in accordance with the logical integrity required by this topic. |
4 |
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9 |
Performs a literature search in scientific databases; in particular, to scan the databases in an appropriate manner, to list and categorize the listed items. |
4 |
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10 |
Has English capability at a level adequate to read and understand a scientific text in his field of specialization, written in English. |
3 |
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11 |
Compiles his/her knowledge in his/her field of specialization. in a presentation format, and presents in a clear and effective way. |
3 |
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12 |
Writes a computer code aimed at a specific purpose, in general, and related with his/her field of specialization, in particular |
4 |
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13 |
Pursues research ın new topics based on his/her existing research experıence. |
4 |
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14 |
Gives guidance in environments where problems related with his/her field need to be solved, and takes initiative. |
3 |
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15 |
Develops and evaluates projects, policies and processes in his field of specialization. |
5 |
| * Contribution levels are between 0 (not) and 5 (maximum). |
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| Student Workload - ECTS |
| Works | Number | Time (Hour) | Total Workload (Hour) |
| Course Related Works |
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Class Time (Exam weeks are excluded) |
15 |
3 |
45 |
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Out of Class Study (Preliminary Work, Practice) |
13 |
4 |
52 |
| Assesment Related Works |
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Homeworks, Projects, Others |
3 |
5 |
15 |
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Mid-term Exams (Written, Oral, etc.) |
1 |
12 |
12 |
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Final Exam |
1 |
24 |
24 |
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Total Workload: | 148 |
| Total Workload / 25 (h): | 5.92 |
| ECTS Credit: | 6 |
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